The semiconductor industry faces a computational crisis in extreme ultraviolet (EUV) lithography optimization, where traditional methods consume billions of CPU hours while failing to achieve sub-nanometer precision. We present a physics-constrained adaptive learning framework that automatically calibrates electromagnetic approximations through learnable parameters $\boldsymbolθ = \{θ_d, θ_a, θ_b, θ_p, θ_c\}$ while simultaneously minimizing Edge Placement Error (EPE) between simulated aerial ima...

Analog in-memory computing (AIMC) accelerators enable efficient deep neural network computation directly within memory using resistive crossbar arrays, where model parameters are represented by the conductance states of memristive devices. However, effective in-memory training typically requires at least 8-bit conductance states to match digital baselines. Realizing such fine-grained states is costly and often requires complex noise mitigation techniques that increase circuit complexity and ener...